Position of (enumerated) parts of the laboratory (version 0703):
Labeling (and characteristics) of individual rooms:
room No.F39 - "black" office (staff - topological design of structures),
room No.F40 - "grey" office (staff - technological processes supervision),
room No.F41 - "grey service" (staff - maintenance, part of technological equipment),
room No.F42 - "grey" room (HVAC, part of technological equipment),
room No.F43A - "black entrance" (entrance area),
room No.F43B - "grey gowning area" (first gowning),
room No.F44 - "white gowning area" (final gowning),
room No.F45 - cleanroom of class 10000 (wet- and dry- etching),
rooms No.F46+F47 - cleanroom of basic class 1000 comprising zones of class 100 (lithography)
| Area of electron-beam lithography + microscopy (EBL/SEM): E1 - basic unit (column) E2 - rack comprising supply and control units E3 - control panel EBL/SEM E4 - antivibrational block (for EBL/SEM) E5 - laminar zone (+/-0,5°C, class 100) E6 - roughing pump E7 - coil X (of spurious magnetic fields compensation system) E8 - coil Y ( - " - ) E9 - coil Z ( - " - ) E10 - EBL/SEM operator seat E11 - EBL/SEM system thermostat unit E12 - unit of electron lens thermostat (stabil. to 0,1°C) E13 - EBL/SEM control UPS |
Area of resist processing (room No.F47): R1 - chemical flowbox (electron resist deposition) R2 - chem.flowbox (electron resist development) R3 - chem.flowbox (photoresist deposition) R4 - chem.flowbox (photoresist processing) R5 - box for resists (exhausted) R6 - box for developers, etc. (exhausted) R7 - storno R8 - laminar-flow area, class 100 R9 - anti-static curtain |
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| Photolithography and optical microscopy area (room No.F47): F1 - hanging laminar-flow unit (optical microscope) F2 - hanging laminar-flow unit (diagnostics) F3 - hanging laminar-flow unit (contact aligner) F4 - hanging laminar-flow unit (projectional aligner) F5 - antivibrational block (for contact aligner) F6 - antivibrational block (for projectional aligner) |
Wet- a dry- etching cleanroom (room No.F45): L1 - fume hood (corrosionless construction) L2 - chemical flowbox (wet etching - acids, bases) L3 - storno L4 - chemical flowbox (wet etching - organics) L5 - box for anorganic chemicals (exhausted) L6 - box for organic chemicals (exhausted) L7 - dry-etching equipment (PE) L8 - dry-etching equipment (RIE) L9 - hanging laminar-flow unit (optical microscope) L10 - hanging laminar-flow unit |
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| Technical background (rooms No.F41 and F42 - HVAC): T1 - compressed gas (O2) T2 - compressed gas (CF4) T3 - compressed gas (spare position) T4 - equipment for pure water preparation T5 - oil-free compressor T6 - pump and central vacuum-reservoir T7 - compressed gas (forming gas Ar+5%H2) T8 - oven T9 - die saw T10 - thin-layer deposition equipment T11 - LN2 -> gaseous nitrogen generator |
Some other parts: F7 - antivibrational block (room No.F40) O1 - check-window to the cleanroom No.F46 P1 - heating gas input valve (on the outer wall) P2 - gas-heating for the input HVAC unit U1 - washer incl. safety shower (room No.F47) U2 - washer incl. safety shower (room No.F45) U3 - washer in room No.F39 U4 - washer in room No.F40 U5 - washer in room No.F41 U6 - washer + sink in room No.F42 U7 - washer + sink in room No.F42 (maintenance) V1 - HVAC units (according to the HVAC design) V2 - main computer for HVAC measur.&control |
Operational Rules (in Czech) for the laboratory here.
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Orientation of the central EBL unit vs the beam blanker |
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Last updated:
Jun 12, 2009
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