Opening the photolithography cleanrooms
Opening the photolithography cleanrooms
Building the laboratory (a brief
description in Czech enclosed):
- completing the technical documentation:
Oct 1998
- finishing the ventilation system: Jul 1999
- opening the section of the photolithography for hybrid structures:
Sep 1999
- opening the section of
the photolithography for monolithic structures:
Aug 2000
|
- preparing documentation
for building of the new cleanrooms for electron-beam nanolithography:
Sep 2006 - building of the new EBL cleanrooms: since Jan 2007 |
Click to overview the laboratory.
Rules of operation (in Czech) which are to be observed by all persons
entering the cleanrooms
here .
Non-complicated photomasks can be
designed directly in the laboratory.
Lithography can be performed on substrates from various semiconductor and
other materials.
Assembling and wiring of most
experimental samples can be
performed in the laboratory, as well.
Examples of some samples prepared in the laboratory
here.
|
Contact to the laboratory: |
Phone: (+420) 220318-###: | |||
| Karel Hruska | - | hruskak@fzu.cz | -527,(-460, -492) | |
| Stanislav Hucek | - | hucek@fzu.cz | -413,(-460, -492) | |
| Vlastimil Jurka | - | jurka@fzu.cz | -527,(-460, -492) | |
| Zdenek Vyborny | - | vyborny@fzu.cz | -589,(-413, -460) |
Related links:
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Last updated: Mar 4, 2010
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